Silica Thin Films
Project Number:

This is patented technology for production of thermally robust silica thin films with controlled thickness and uniform porosity. The method utilizes unmodified silica sol in sequential absorption with cationic polyelectrolyte and requires no CVD deposition of Silicon Oxide precursor or coating of partially hydrolyzed silicon alkoxide solutions.

With RI ranges from 1.16 to 1.3; the films have superior optical properties. While the primary application considered for this technology is for materials requiring a tunable optical pathlength, such as antireflective coatings, the porous nature of these silica films holds promise for their use in low-dielectric materials and molecular separations.

For more information please contact:

Conrad F. Mir
President, CEO and Director
Calmare Therapeutics Incorporated
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Tel: 203.368.6044